BeginnerQuestion 4 of 50

What causes leakage power in a CMOS transistor?

From PDVerse Low-Power Physical Design Mentor Guide, part of the pdVerse Mentor Guide

Short Answer

An off transistor still conducts a small current through three main paths: subthreshold conduction under the channel, tunnelling through the gate oxide, and reverse-biased junction leakage including GIDL. At advanced nodes subthreshold leakage dominates, because threshold voltages were lowered to keep gates fast. Gate leakage was brought down by high-k metal gates, so it matters less than it once did.

Technical Reference DiagramWhat causes leakage power in a CMOS transistor?

Technical Explanation

  • Subthreshold leakage: with gate voltage below Vt, carriers still diffuse from source to drain; current rises exponentially as Vt drops.
  • Gate leakage: thin oxide lets electrons tunnel through the gate; high-k dielectrics thickened the physical layer and cut this path.
  • Junction leakage: reverse-biased drain and source diodes leak into the well, rising with temperature.
  • GIDL (gate-induced drain leakage): a strong field where gate overlaps drain pulls current into the substrate, worse at high drain bias.
  • Subthreshold leakage grows steeply with temperature and at the fast corner, so it sets the leakage signoff number.
  • Leakage also depends on input state: which transistors in a stack are off changes the cell's leakage, so libraries list it per input pattern.
  • These mechanisms drive the fixes: higher-Vt cells, transistor stacking, reverse body bias and power gating.

Common Mistake

The Trap: Assuming leakage is one fixed number per cell.

  • It varies by orders of magnitude with Vt flavour, temperature, corner and input state, so a leakage number without its corner means little.
  • Always quote leakage with its Vt flavour, corner and temperature, and compare the fast-hot number with the budget.

Follow-up Question & Model Response

"Why does a stack of two off transistors leak less than one?"

Candidate Model Response: The node between the two transistors floats up to a small positive voltage. That gives the upper transistor a negative gate-to-source voltage and raises its effective Vt through the body effect. The lower transistor now sees only that small node voltage across it, so drain-induced barrier lowering drops too, and the combined subthreshold current falls sharply. Designers use this stack effect in sleep vectors and in stacked-transistor leakage cells.

Practical Example

Design Scenario: (illustrative) An SVT inverter in PD_CPU leaks 10 nA at 25 °C and about 80 nA at 125 °C. Swapping it for an HVT version cuts leakage to about 2 nA at 25 °C, with a delay penalty on the order of 20%. Check the scale: 1 million SVT cells at 80 nA and 0.9 V is 72 mW hot. With the same 8x temperature factor, HVT sits near 16 nA per cell, about 14 mW, so the choice is worth nearly 60 mW at the hot corner.

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